Application
Ultrapure Water
Key Features
and other electronics industries is increasing, and as related industries advance,
the purity and reliability standards for ultrapure water are becoming even stricter.
TRILITE® ultrapure water ion exchange resins have been delivered globally and internationally to ultrapure water facilities in the semiconductor, display (OLED, LCD) industries, and have acquired references of trust. They are contributing to improving our customers' competitiveness through stable quality control and on-time delivery. TRILITE® ion exchange resins for ultrapure water are divided into URR100, UPR200, UPR300, and UPR400 series depending on the required ultrapure water quality.
- TRILITE® ion exchange resins for ultrapure water feature
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Strict standard for uniformity coefficient (1.1↓), to result in high operating capacity at fast service flow
Very high conversion rate of resins to minimize ionic leakage(H+, OH-)
Strict quality control over TOC(Total organic carbon) and trace metal ions
Ultrapure Water
Production
Process
Product
Selection Guide
| Product Name | Outlet condition | Features and Application |
|---|---|---|
| UPRM100U | Guarantee) Resistivity > 17.0㏁∙cm Actual) Resistivity > 18.0㏁∙cm |
General electronics Demineralization, Final polisher |
| UPRM200U | Resistivity > 18.1㏁∙cm(in 30 min) △TOC < 5 ppb (in 120min) |
Display Demineralization, Final polisher |
| UPRM300U | Resistivity > 18.2㏁∙cm(in 30 min) △TOC < 1 ppb (in 180min) |
Display, Semiconductor grade Final polisher |
| UPRM400U | Resistivity > 18.2㏁∙cm(in 30 min) △TOC < 1 ppb (in 180min) Metal impurity (ppm, as Dry Base) Na<1, Fe<1, Zn<0.5, Al<0.5, Cu<0.5 |
Semiconductor grade Final polisher |
| UPHR1 | Resistivity > 18.2㏁∙cm(in 24hr) △TOC < 1 ppb (in 24hr) |
Removal of H2O2 in semiconductors |
| CLR-B3UP | Resistivity > 17.0㏁∙cm(in 48hr) △TOC < 5 ppb (in 48hr) |
Ultrapure Water boron removal |
Product
| Product Name | Product Category | Information | TDS |
|---|
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