Application
Ion Exchange Resins for Ultrapure Water
Samyang's TRILITE® ion exchange resins for ultrapure water are optimized for display (OLED/LCD) and semiconductor ultrapure water production, with a uniformity coefficient of 1.1 or less and ionic conversion of at least 99.9% (H⁺) and 97.0% (OH⁻).
Key Features
and other electronics industries is increasing, and as related industries advance,
the purity and reliability standards for ultrapure water are becoming even stricter.
TRILITE® ion exchange resins for ultrapure water have been delivered domestically and internationally to ultrapure water facilities in the semiconductor, display (OLED, LCD) industries, and have acquired references of trust. They are contributing to improving our customers' competitiveness through stable quality control and timely delivery. TRILITE® ion exchange resins for ultrapure water are divided into URR100, UPR200, UPR300, and UPR400 series depending on the required ultrapure water quality.
TRILITE® ion exchange resins for ultrapure water feature
- TRILITE® ion exchange resins for ultrapure water have a very high level of uniformity coefficient (less than 1.1) to achieve high operational exchange capacity even at high flow rates.
- To minimize ion leakage, it has very high H and OH conversion rates.
- Strict management is maintained to control total organic carbon (TOC) and trace metal ion leakage.
Ultrapure Water
Production
Process
Ultrapure water production purifies raw water step by step into industrial water, pure water, and finally ultrapure water. The process consists of Pre-treatment → Make-up system → Polishing system.
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Step 1 – Pre-treatment :
Raw water is taken in and passed through a multi-media filter (MMF) and an activated carbon filter to remove suspended solids (SS) and residual chlorine. -
Step 2 – Make-up system :
Dissolved ions, organic matter (TOC), bacteria, dissolved oxygen, and carbon dioxide are thoroughly removed. -
Step 3 – Polishing system :
The final step polishes out the remaining trace ions, particles, and organics. Depending on the required grade, it is divided into display (OLED) grade and semiconductor grade; the semiconductor grade adds H2O2 removal and boron removal processes.
Product
Selection Guide
| Product Name | Outlet condition | Features and Application |
|---|---|---|
| UPRM100U | Guarantee) Resistivity > 17.0㏁∙cm Actual) Resistivity > 18.0㏁∙cm |
General electronics Demineralization, Final polisher |
| UPRM200U | Resistivity > 18.1㏁∙cm(in 30 min) △TOC < 5 ppb (in 120min) |
Display Demineralization, Final polisher |
| UPRM300U | Resistivity > 18.2㏁∙cm(in 30 min) △TOC < 1 ppb (in 180min) |
Display, Semiconductor grade Final polisher |
| UPRM400U | Resistivity > 18.2㏁∙cm(in 30 min) △TOC < 1 ppb (in 180min) Metal impurity (ppm, as Dry Base) Na<1, Fe<1, Zn<0.5, Al<0.5 |
Semiconductor grade Final polisher |
| UPHR1 | Resistivity > 18.2㏁∙cm(in 24hr) △TOC < 1 ppb (in 24hr) |
Removal of organic contaminants in semiconductors |
| CLR-B3UP | Resistivity > 17.0㏁∙cm(in 48hr) △TOC < 5 ppb (in 48hr) |
Ultrapure Water boron removal |
Product
| Product Name | Product Category | Information | TDS |
|---|
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